Photoresists

Abstract

Lithographic technology by photoresist is an important technique for today's electronic industries. In the manufacture of a semiconductor and a liquid crystal display (LCD), a photoresist is used as the key photo sensitive material. Phenolic resin is the base polymer that controls photoresist characteristics and plays an active role in these vital electronic industries. In this chapter, we discuss phenolic resins for photoresists, meta-para cresol novolaks, important properties for photoresist such as meta-para ratio, molecular weight, and alkali dissolution rate. Moreover, various types of phenolic resins for photoresists and production technology are also discussed. © 2010 Springer-Verlag Berlin Heidelberg.