Strain relief analysis of InN quantum dots grown on GaN

Citations of this article
Mendeley users who have this article in their library.

This article is free to access.


We present a study by transmission electron microscopy (TEM) of the strain state of individual InN quantum dots (QDs) grown on GaN substrates. Moiré fringe and high resolution TEM analyses showed that the QDs are almost fully relaxed due to the generation of a 60° misfit dislocation network at the InN/GaN interface. By applying the Geometric Phase Algorithm to plan-view high-resolution micrographs, we show that this network consists of three essentially non-interacting sets of misfit dislocations lying along the 〈1̄21̄0〉 directions. Close to the edge of the QD, the dislocations curve to meet the surface and form a network of threading dislocations surrounding the system.




Lozano, J. G., Sánchez, A. M., García, R., Ruffenach, S., Briot, O., & González, D. (2007). Strain relief analysis of InN quantum dots grown on GaN. Nanoscale Research Letters, 2(9), 442–446.

Register to see more suggestions

Mendeley helps you to discover research relevant for your work.

Already have an account?

Save time finding and organizing research with Mendeley

Sign up for free