Cu4 cluster doped monolayer MoS2 for CO oxidation

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Abstract

The catalytic oxidation of CO molecule on a thermodynamically stable Cu4 cluster doped MoS2 monolayer is investigated by density functional theory (DFT) where the reaction proceeds in a new formation order of COOOCO∗ (O2 ∗ + 2CO∗ → COOOCO∗), OCO∗ (COOOCO∗ → CO2 + OCO∗), and CO2 (OCO∗ → CO2) desorption with the corresponding reaction barrier values of 0.220 eV, 0.370 eV and 0.119 eV, respectively. Therein, the rate-determining step is the second one. This low barrier indicates high activity of this system where CO oxidation could be realized at room temperature (even lower). As a result, the Cu4 doped MoS2 could be a candidate for CO oxidation with lower cost and higher activity without poisoning and corrosion problems.

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Chen, Z. W., Yan, J. M., Zheng, W. T., & Jiang, Q. (2015). Cu4 cluster doped monolayer MoS2 for CO oxidation. Scientific Reports, 5. https://doi.org/10.1038/srep11230

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