Alternating Be and C doping for strain compensated GaAs/AlAs distributed Bragg reflectors

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Abstract

We demonstrate a new type of strain compensated, p-type distributed Bragg reflector (DBR) using alternating doping of Be in GaAs and C in AlAs with carbon concentrations as high as 2 × 1020 cm-3. These DBRs exhibit simultaneously a high crystalline quality, an excellent surface morphology, and no misfit dislocations, which cannot be achieved in undoped or Be-doped DBRs. The absolute optical reflectivity is as high as in the undoped DBR. The differential resistance of these structures is comparable to best reported values in Be-doped DBRs. © 1997 American Institute of Physics.

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Mazuelas, A., Hey, R., Jenichen, B., & Grahn, H. T. (1997). Alternating Be and C doping for strain compensated GaAs/AlAs distributed Bragg reflectors. Applied Physics Letters, 70(16), 2088–2090. https://doi.org/10.1063/1.118952

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