Sub-100 nm organic light-emitting diodes patterned with room temperature imprint lithography

Abstract

We demonstrate fabrication of structurally regular, nanoscale organic light-emitting diodes (OLEDs) using room temperature imprint lithography (RTIL). An insulating polymer layer spin-coated onto indium-tin oxide (ITO) glass is patterned by RTIL, followed by etching with an oxygen plasma to define the light-emitting area for the fabrication of OLEDs with 80 nm linewidth. The process of etching by oxygen plasma leads to an oxygen treatment of the exposed ITO surface and brings about the beneficial effects of the treatment. A regular periodic structure of the polymer that results from the patterning scatters the emitted light, resulting in a small shift in the electroluminescence spectrum and anisotropic far-field radiation intensity. The nanoscale patterning is found not to affect the luminance.