Preparation of calcium phosphate films by radiofrequency magnetron sputtering

Abstract

Calcium phosphate films were prepared on titanium substrates by radiofrequency (RF) magnetron sputtering at RF powers from 75 to 150 W. Hot-pressed β-tricalcium phosphate (β-TCP) plates with a high density (>99.6%) were used as a sputtering target. The substrate was not intentionally heated. The films consisted of amorphous calcium phosphate and oxyapatite (Ca 10(PO 4) 6O) phases. The ratio of the oxyapatite phase depended on the sputtering conditions of RF power, oxygen gas concentration in the sputtering gas (CO 2) and total pressure in the chamber. The (002) preferred orientation of oxyapatite phase was observed. The deposition rate of films increased with increasing RF power and decreasing Co 2. The highest deposition rate was 0.143 nm·s -1 (0.515 μm -1). © 2005 The Japan Institute of Metals.