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DEFECTS ON ACTIVATED SILICA SURFACE

  • RADZIG V
Springer Netherlands, (2000), 339-370
DOI: 10.1007/978-94-010-0944-7_12
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Abstract

The review (68 refs.) summarizes the results of exptl. and quantum-chem. anal. of the structure, spectral parameters (optical, radio, and IR spectroscopic), and reactivity of the main types of paramagnetic and diamagnetic point defects that are stabilized on the activated silica surface or can be obtained by its directed chem. modification. [on SciFinder(R)]

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RADZIG, V. A. (2000). DEFECTS ON ACTIVATED SILICA SURFACE. In Defects in SiO2 and Related Dielectrics: Science and Technology (pp. 339–370). Springer Netherlands. https://doi.org/10.1007/978-94-010-0944-7_12

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