This paper investigates the repeatable unipolar/bipolar resistive switching memory characteristics in a copper/germanium-oxide/tungsten (Cu/GeO x/W) structure. The switching mechanism occurs because of the lower barrier height for hole injection rather than electron injection. Therefore, Cu ions, as a positive charge, migrate before initiating growth at the GeO x/W interface and dissolving at the GeO x/Cu interface. The diameter of the Cu nanofilament increases linearly from 0.13 Å to 25 nm as current compliances increase from 1 nA to 10 mA, as calculated using the other approach. The crystalline Cu nanofilament was also confirmed by high-resolution transmission electron microscopy analysis under SET. Good data retention with high resistance ratios of 10 2-10 5 (and >10 4 at 85 °C) and ∼10 9 was obtained under the bipolar and unipolar modes, respectively. Therefore, a maximum memory size of 5000 Pbit/in 2 can be designed in the future. © 2012 American Institute of Physics.
CITATION STYLE
Rahaman, S. Z., Maikap, S., Chen, W. S., Lee, H. Y., Chen, F. T., Kao, M. J., & Tsai, M. J. (2012). Repeatable unipolar/bipolar resistive memory characteristics and switching mechanism using a Cu nanofilament in a GeO x film. Applied Physics Letters, 101(7). https://doi.org/10.1063/1.4745783
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