Influence of normal load on the three-body abrasion behaviour of monocrystalline silicon with ellipsoidal particle

Abstract

Currently, monocrystalline silicon has been widely applied in micro-electro-mechanical systems (MEMSs). It is of importance to reveal the wear behavior of the MEMS and evaluate the planarization of silicon surface in chemical mechanical polishing (CMP). In this study, molecular dynamics simulation was used to investigate the nano three-body abrasion of monocrystalline silicon with a diamond ellipsoidal particle sandwiched between two silicon specimens. The normal load acting on the ellipsoidal particle was varied from 80 nN to 240 nN. Results indicate that the movement pattern of the particle changes from rolling to sliding when the normal load becomes greater than 160 nN. Using the criterion of particle movement pattern by comparing the value of e/h and coefficient of friction, the particle movement pattern can be accurately predicted. The evolution of force in the abrasion process depicts both friction force and normal load fluctuations in sinusoid-like curve for the rolling ellipsoidal particles, whereas the front cutting of particle results in an increase in the friction force, making it greater than the normal force for sliding particles under high velocity. The plastic deformation of monocrystalline silicon is attributed to the phase transformation, which is clearly impacted by the movement pattern of the particle. The rolling of the particle causes substrate deformation with periodical inhomogeneous characteristics, while sliding helps produce a high-quality surface and improves efficiency in the CMP process.