Resistive switching behaviour in ZnO and VO2 memristors grown by pulsed laser deposition

40Citations
Citations of this article
46Readers
Mendeley users who have this article in their library.

Abstract

The resistive switching behaviour observed in microscale memristors based on laser ablated ZnO and VO2 is reported. A comparison between the two materials is reported against an active device size. The results show that devices up to 300 × 300 μm2 exhibit a memristive behaviour regardless of the device size, and 100 × 100 μm2 ZnO-based memristors have the best resistance off/on ratio. © The Institution of Engineering and Technology 2014.

Cite

CITATION STYLE

APA

Macaluso, R., Mosca, M., Costanza, V., D’Angelo, A., Lullo, G., Caruso, F., … Di Quarto, F. (2014). Resistive switching behaviour in ZnO and VO2 memristors grown by pulsed laser deposition. Electronics Letters, 50(4), 262–263. https://doi.org/10.1049/el.2013.3175

Register to see more suggestions

Mendeley helps you to discover research relevant for your work.

Already have an account?

Save time finding and organizing research with Mendeley

Sign up for free