The resistive switching behaviour observed in microscale memristors based on laser ablated ZnO and VO2 is reported. A comparison between the two materials is reported against an active device size. The results show that devices up to 300 × 300 μm2 exhibit a memristive behaviour regardless of the device size, and 100 × 100 μm2 ZnO-based memristors have the best resistance off/on ratio. © The Institution of Engineering and Technology 2014.
CITATION STYLE
Macaluso, R., Mosca, M., Costanza, V., D’Angelo, A., Lullo, G., Caruso, F., … Di Quarto, F. (2014). Resistive switching behaviour in ZnO and VO2 memristors grown by pulsed laser deposition. Electronics Letters, 50(4), 262–263. https://doi.org/10.1049/el.2013.3175
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