Fabrication of antireflection structures on glassy carbon surfaces using electron beam lithography and oxygen dry etching

Abstract

Glassy carbon (GC) substrate was used for the fabrication of antireflection (AR) structures as this material has high thermal stability, thereby being suitable for a quartz mold. In order to fabricate the AR structures on the GC surface, electron beam lithography (EBL) and oxygen dry etching were carried out. EBL was used for the fabrication of submicron order mask patterns on the GC surface. By oxygen ion beam bombardment, the GC surface was sharpened and conical-shaped structures were fabricated. Almost zero reflection was observed on this surface in the visible light region. © 2008 IOP Publishing Ltd.