Kinetic study of vanadium-oxides' magneto-sputter deposition based on experimental reaction data

Abstract

Based on a physical model, the growth rates and the transformation rates in the magneto-sputter process for V2O3, VO2 and V2O5 are obtained by fitting the experimental data. From these values one can see, under the conditions of the experiment in this article, the growth rate for VO2 is higher than that for V2O3 and V2O5 and the transformation rate for VO2 transforming to V2O5 is higher than that for V2O3 transforming to VO2. Also, in the view of the deposition time, in the beginning of deposition process, the percentage contents of each kind of vanadium-oxides change rapidly, and with the time growing, this change become gently. If both concerning the thickness of the deposited film and the percentage content of VO2, under the conditions of the experiment in this paper, the deposition time should be round 20 minutes. © 2012 Springer-Verlag Berlin Heidelberg.