Horizontally Aggregation of Monolayer Reduced Graphene Oxide Under Deep UV Irradiation in Solution

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Abstract

Graphene has been widely used in novel optoelectronic devices in decades. Nowadays, fabrication of large size monolayer graphene with spectral selectivity is highly demanded. Here, we report a simple method for synthesizing large size monolayer graphene with chemical functionalized groups in solution. The few layer nano-graphene can be exfoliated into monolayer nano-graphene under short time UV irradiation in protic solution. The exfoliated monolayer nano-graphene could experience deoxygenation during long time UV exposure. At the same time, the edge of nano-graphene could be activated under deep UV exposure and small size nano-graphene sheets further aggregate horizontally in solution. The size of aggregated rGO increase from 40 nm to a maximum of 1 μm. This approach could be one promising cheap method for synthesizing large size monolayer reduced graphene oxide in the future.

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He, X., Zhang, S., Pan, H., Chen, J., & Xu, J. (2019). Horizontally Aggregation of Monolayer Reduced Graphene Oxide Under Deep UV Irradiation in Solution. Nanoscale Research Letters, 14. https://doi.org/10.1186/s11671-019-2940-z

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