Method of fabrication for encapsulated polarizing resonant gratings

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Abstract

In this letter, we present a novel method of fabricating encapsulated resonant gratings. The fabrication method uses selective etching, conformal deposition, conventional lithography, and direct bonding techniques. Our letter includes simulation and experimental results, confirming a strong resonance unique to the TE polarization at 1550 nm with a 5 nm full-width at half-maximum. © 1989-2012 IEEE.

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Pung, A. J., Carl, S. R., Srimathi, I. R., & Johnson, E. G. (2013). Method of fabrication for encapsulated polarizing resonant gratings. IEEE Photonics Technology Letters, 25(15), 1432–1434. https://doi.org/10.1109/LPT.2013.2266575

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