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Molecular-beam Deposition of High-k Gate Dielectrics for Advanced CMOS

  • Dimoulas A
Springer-Verlag, (2006), 3-15
DOI: 10.1007/1-84628-235-7_1
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Dimoulas, A. (2006). Molecular-beam Deposition of High-k Gate Dielectrics for Advanced CMOS. In Materials for Information Technology (pp. 3–15). Springer-Verlag. https://doi.org/10.1007/1-84628-235-7_1

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