Direct nanoimprinting for micro- and nanosystems

Abstract

This chapter focuses on direct-nanoimprinting as an innovative structuring technique for micro- and nano-opto-electro-mechanical systems (MOEMS/NOEMS). Direct-nanoimprinting is understood in this chapter as a structure replication process that uses nanoimprinting to create a functional device structure in a single step and that does not require further pattern transfer steps. The MOEMS and NOEMS discussed in this chapter comprise devices or systems being mainly in the micron resolution range but with nano-structures as key functional elements. Nanoimprinting allows the replication of these elements with a high resolution and high aspect ratios for a low to moderate price compared to other high-end lithography processes. Classical photolithography techniques might offer a similar or even higher resolution, however direct-patterning techniques as nanoimprinting allow the additional integration of three-dimensional (3D) structures in the same single pattern step. This would be much more challenging with classical photolithography techniques. As a main focus, this chapter discusses different approaches of nanoimprint molds.