Gettering mechanism in hydrocarbon-molecular-ion-implanted epitaxial silicon wafers revealed by three-dimensional atom imaging

Abstract

The interaction of iron (Fe) with defects induced by a high hydrocarbon-molecular-ion-implantation dose of 1 ' 1016 cm%2 in a Czochralski-grown silicon substrate and an epitaxial growth layer was investigated using secondary ion mass spectroscopy, transmission electron microscopy, and laser-assisted atom probe tomography (L-APT). High-dose hydrocarbon-molecular-ion-implantation formed two types of defects in the projection range: stacking faults and carbon agglomerates. It was demonstrated that the dominant gettering mechanisms of the two types of defects differ. Carbon agglomerates formed by implantation of the epitaxial growth layer exhibited high gettering efficiency for Fe. The L-APT data indicated that the Fe gettering efficiency is strongly affected by the distribution of oxygen atoms in carbon agglomerates. It is suggested that Fe gettering on agglomerates is due to the strong electronic interaction between carbon agglomerates and Fe but suppressed by oxygen atoms in agglomerates.