Analysis and fabrication of antireflection coating with ultralow residual reflectance for single wavelength

  • Huasong Liu 刘
  • Yiqin Ji 季
  • Zhanshan Wang 王
  • et al.
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Abstract

With the great development of laser standard systems and high-precision laser measurement systems, demands of optical systems have resulted in a dramatic increase in performance requirements for thin ?lm optical filters. In this letter, the analysis and manufacture of the double-layer structure of the ultra-low residual reflectance for a single wavelength are reviewed. From a manufacturing standpoint, the manufacture and analysis of these coatings, which satisfy the requirements mentioned, pose as major problems. The coatings are characterized according to ellipsometry analyses and adjustment of the center wavelength of the antireflection (AR) coating Ta2O5/SiO2 double layers. AR coating is deposited on silica substrates by ion beam sputtering (IBS) technique, thus, achieving residual reflectance of less than 0.005% at lambda;0=632.8 nm. © 2010 Chinese Optics Letters.

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Huasong Liu, 刘华松, Yiqin Ji, 季一勤, Zhanshan Wang, 王占山, Deying Chen, 陈德应, Dandan Liu, 刘丹丹, Ri Wang, 王日, … Fuhao Jiang, 姜福灏. (2010). Analysis and fabrication of antireflection coating with ultralow residual reflectance for single wavelength. Chinese Optics Letters, 8(S1), 207–209. https://doi.org/10.3788/col201008s1.0207

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