Analysis and fabrication of antireflection coating with ultralow residual reflectance for single wavelength

Abstract

With the great development of laser standard systems and high-precision laser measurement systems, demands of optical systems have resulted in a dramatic increase in performance requirements for thin ?lm optical filters. In this letter, the analysis and manufacture of the double-layer structure of the ultra-low residual reflectance for a single wavelength are reviewed. From a manufacturing standpoint, the manufacture and analysis of these coatings, which satisfy the requirements mentioned, pose as major problems. The coatings are characterized according to ellipsometry analyses and adjustment of the center wavelength of the antireflection (AR) coating Ta2O5/SiO2 double layers. AR coating is deposited on silica substrates by ion beam sputtering (IBS) technique, thus, achieving residual reflectance of less than 0.005% at lambda;0=632.8 nm. © 2010 Chinese Optics Letters.