Defect tolerance will become more important as feature sizes shrink closer to single digit nanometer dimensions. This is true whether the chips are manufactured using top-down methods (e.g., photolithography) or bottom-up methods (e.g., chemically assembled electronic nanotechnology, or CAEN). In this paper, we propose a defect tolerance methodology centered around reconfigurable devices, a scalable testing method, and dynamic place-and-route. Our methodology is particularly well suited for CAEN.
CITATION STYLE
Mishra, M., & Goldstein, S. C. (2003). Defect Tolerance at the End of the Roadmap. In IEEE International Test Conference (TC) (pp. 1201–1210). https://doi.org/10.1007/1-4020-8068-9_3
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