A drastic increase in the p-type carrier concentration and decrease in the activation energy of an acceptor are achieved by using a method of pulse supply of the source gases for AlGaN and GaN. This method offers a new way of producing a low-resistance p-AlGaN and p-GaN epitaxial layer. Copyright © 2012 Author(s).
CITATION STYLE
Aoyagi, Y., Takeuchi, M., Iwai, S., & Hirayama, H. (2012). Formation of AlGaN and GaN epitaxial layer with high p-carrier concentration by pulse supply of source gases. AIP Advances, 2(1). https://doi.org/10.1063/1.3698156
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