CITATION STYLE
Haider, M., Müller, H., Uhlemann, S., Hartel, P., & Zach, J. (2009). Developments of aberration correction systems for current and future requirements. In EMC 2008 14th European Microscopy Congress 1–5 September 2008, Aachen, Germany (pp. 9–10). Springer Berlin Heidelberg. https://doi.org/10.1007/978-3-540-85156-1_5
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