Fabrication and photoresponse of ZnO nanowires/CuO coaxial heterojunction

30Citations
Citations of this article
32Readers
Mendeley users who have this article in their library.

This article is free to access.

Abstract

The fabrication and properties of n-ZnO nanowires/p-CuO coaxial heterojunction (CH) with a photoresist (PR) blocking layer are reported. In our study, c-plane wurtzite ZnO nanowires were grown by aqueous chemical method, and monoclinic CuO (111) was then coated on the ZnO nanowires by electrochemical deposition to form CH. To improve the device performance, a PR layer was inserted between the ZnO buffer layer and the CuO film to serve as a blocking layer to block the leakage current. Structural investigations of the CH indicate that the sample has good crystalline quality. It was found that our refined structure possesses a better rectifying ratio and smaller reverse leakage current. As there is a large on/off ratio between light on and off and the major light response is centered at around 424 nm, the experimental results suggest that the PR-inserted ZnO/CuO CH can be used as a good narrow-band blue light detector. © 2013 Wu et al.; licensee Springer.

Cite

CITATION STYLE

APA

Wu, J. K., Chen, W. J., Chang, Y. H., Chen, Y. F., Hang, D. R., Liang, C. T., & Lu, J. Y. (2013). Fabrication and photoresponse of ZnO nanowires/CuO coaxial heterojunction. Nanoscale Research Letters, 8(1), 1–5. https://doi.org/10.1186/1556-276X-8-387

Register to see more suggestions

Mendeley helps you to discover research relevant for your work.

Already have an account?

Save time finding and organizing research with Mendeley

Sign up for free