Properties of amorphous carbon thin films for solar cell applications

Abstract

This paper is presented the properties of amorphous carbon (a-C) thin films for solar cell application. Amorphous carbon thin films have been deposited on silicon substrate by thermal chemical vapor deposition (thermal-CVD) method at various deposition temperatures. The surface morphology, electrical properties and crystallinity of these films have been studied using Analytical Scanning Electron Microscope (SEM) JEOL JSM-6360LA, Current Voltage (I-V) Measurement (Advantest R6243 DC Voltage Current Source/Monitor Software) and the D5000 Siemen Difractrometer (XRD) respectively. It was found that increasing deposition temperature had the most influence on the a-C thin films properties. In addition the carrier gas flow also showed a secondary impact on the properties of a-C thin films. © 2010 American Institute of Physics.