Atmospheric pressure plasma processing of an optical sinusoidal grid

Abstract

Sinusoidal grid with nanometric precision is adopted as a surface encoder to measure multiple degree-of-freedom motions. This paper proposes the atmospheric pressure plasma processing (APPP) technique to fabricate an optical sinusoidal grid surface. The characteristics of removal function and surface generation mechanism are firstly presented. Both simulation and experiment validate the effectiveness of APPP to fabricate a sinusoidal grid surface with nanometric precision. Post mechanical polishing experiments show that APPP features can be well maintained while the surface roughness is greatly reduced to meet the optical requirement.