Nano/Microfabrication Methods for Sensors and NEMS/MEMS

Abstract

An introduction and overview of nanofabrication methods is provided, including physical vapor deposition, atomic layer deposition, focused ion beam processing and electroplating. Atomic layer deposition is an atomic layer-by-layer deposition process which produced conformal coatings with nanometer control of thickness. It has been demonstrated on a wide range of materials, including semiconductors, metals, ceramics and metal oxides. Focused ion beam fabrication uses a beam of metal ions to carry out precision etching, lithography, and CVD with nanometer scale feature sizes, providing versatile processing capabilities. Electroplating through polymer or porous alumina templates provides a route for the fabrication of nanowires by electroplating. These methods of nanofabrication are illustrated with selected examples including an impedance-based biosensor, an SECM probe, nanobowls, sensors, membranes, MEMS/NEMS, and nanowires with novel properties. These selected examples taken from recent research results demonstrate the exciting potential for development of new nanomanufacturing processes that present opportunities for nanodevice fabrication.