Soft X-ray photoelectron emission-microscopy (X-PEEM)

Abstract

Surface and nanoscale aspects are becoming more and more important in modern technology. The ongoing trend for smaller and yet more powerful devices in microelectronics and data storage technology pushes the relevant lateral dimensions far into the sub-micrometer regime. In microelectronics, for example, the smallest lateral dimension of elements in a Random Access Memory (RAM) cell are currently reaching down to about 100 nm and the 65 nm technology node is projected to come within reach in the year 2007 [1]. The bit size in commercially available magnetic data storage has decreased to about 100 μ 500 nm [2], and yet higher storage densities resulting in smaller bit sizes are demonstrated in various research labs throughout the world. At the same time, the relevant vertical dimensions have dropped to the nanometer regime. In order to observe single electron tunnelling phenomena in nonmagnetic or spin-dependent transport effects in magnetic systems, extremely thin films of 1 - 2 nm thickness must be prepared. Paired with these technological developments is a strong scientific activity in the fields of surface physics, surface chemistry, and materials science, which alsoconcerns the creation of a wide variety of nanoscale physical systems. © 2006 Springer.