Development of a controlled in situ thin-film technology for porous anodic alumina-based nanostructures

Abstract

This work is aimed at development of the technology of thin-film porous anodic alumina/aluminum (PAA/Al) structures for optical sensors based on metal-clad waveguides and Al nanomesh films for transparent conductive layers. The method of optical control directly in the process of the structures formation which consists in monitoring of the angular dependence of monochromatic light reflection was used both for the formation of the PAA/Al structures by anodic oxidation, for the widening of pores by wet etching, as well to control the etching of the PAA and monitoring the remaining Al nanomesh.