Abstract
A range of percolating atomic cluster films, with nanoscale overall dimensions, have been studied using a combination of in situ and ex situ electrical transport measurements, together with field emission electron microscopy and atomic force microscopy. Bismuth clusters with mean diameter 20 nm were deposited between electrical contacts defined by electron beam lithography. The morphology of the films can be understood within percolation theory, and the electrical measurements show complex behaviour characteristic of both percolation effects and modification of the cluster films by current flow and by oxidation.
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CITATION STYLE
Schulze, M., Gourley, S., Brown, S. A., Dunbar, A., Partridge, J., & Blaikie, R. J. (2003). Electrical measurements of nanoscale bismuth cluster films. In European Physical Journal D (Vol. 24, pp. 291–294). Springer New York. https://doi.org/10.1140/epjd/e2003-00144-3
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