A general throughput model for parallel cluster tools

Abstract

To effectively evaluate and analyze performance of cluster tools in semiconductor manufacturing, the paper presents a throughput model for parallel cluster tools .For developping this model, the timing diagram is applied to describe the usage of the chamber and robot in parallel processing of cluster tools. Finally, the theoretical model which indicates the relationship between the number of chamber, processing time, transport time, and throughtput is deduced. This model can analyze and computer the wafer period and the batch period fast and accurately. © 2011 Springer-Verlag Berlin Heidelberg.