Atomic layer deposited platinum as a sensor material: Uniformity, 1/f noise, and young’s modulus

Abstract

This paper examines previously unmeasured properties of atomic layer deposited Pt films relevant to sensor design, including wafer-scale uniformity, 1/f noise, Young’s modulus, and the dependence of all these parameters on ALD processing. We observe an increase in the 1/f noise Hooge parameter of nearly two orders of magnitude with decreasing thickness, which introduces constraints on the design of ALD Pt sensors with low noise requirements. Additionally, we measure the variation in wafer-scale electrical uniformity and Young’s modulus with thickness, highlighting tradeoffs associated with integrating ALD Pt films into wafer-scale processing to achieve freestanding structures with high yield.