Superfícies fotocatalíticas de titânia em substratos cerâmicos. Parte II: Substratos, processos de deposição e tratamento térmico

Abstract

This work corresponds to the second part of the review of photocatalytic titania surface on ceramic substrates. In this review, the main factors that influence the production of anatase as the influence of substrate, deposition and heat treatment processes. In substrates with rough surfaces, higher photocatalytic efficiency is reported due to the higher contact area. Deposition processes commonly used in ceramic surfaces are: Magnetron sputtering, dip coating, spin coating, screen printing, silk screen, powder spraying, rotocolor and digital printing. After heat treating the titanium dioxide, it can be seen that at all temperatures and pressures rutile is more stable as anatase. The later is metastable achieving stability only at low temperatures. The transformation from anatase to rutile occurs gradually in a broad temperature range.