The wide spread adoption of products like sub lOOnm CMOS ICs, flat panel displays and photovoltaics, depend on reproducible and cost effective nanomanufacturing technologies. The challenge of driving cost per function down past critical price points requires understanding and coupled optimization of basic materials, equipment and processes at scales well below lOOnm (and variability control to even finer scale), suggesting an ever increasing potential from physically based simulation. However as with the differences in the respective equipment solutions, it is important to reframe the scope of simulation to have the maximum impact on new application areas.
CITATION STYLE
Pinto, M. R. (2007). Nanomanufacturing technology and opportunities through physically-based simulation. In 2007 International Conference on Simulation of Semiconductor Processes and Devices, SISPAD 2007 (pp. 1–8). Springer-Verlag Wien. https://doi.org/10.1007/978-3-211-72861-1_1
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