Principles and applications of chemical vapor deposition (CVD)

Abstract

Chemical vapor deposition (CVD) reactions are extremely important for preparing materials in today's modern technology, particularly for the preparation of thin films for electronic and optical devices, and high temperature hard coatings for applications requiring erosion and/or corrosion resistance. Developing a scientific understanding of these dynamic, steady state chemical reactions which involve gaseous and condensed phases requires modeling the processes by making use of the fundamental principles of chemistry, thermodynamics, chemical kinetics, mass transfer, and the flow behavior of gases. In this paper, the general characteristics and applications of CVD reactions are reviewed, and the chemical reactions for typical processes are given. The paper then focuses on our approach to developing the mechanistic logic for a general model for CVD which can be used to explain and predict the chemistry and rates of CVD processes. © 1982, Walter de Gruyter. All rights reserved.