Monte Carlo Methods for Simulating Thin Film Deposition

Abstract

Thin solid films are used in a wide range of technologies. In many cases, strict control over the microscopic deposition behavior is critical to the performance of the film. For example, today’s commercial microelectronic devices contain structures that are only a few microns in size, and emerging microsystems technologies demand stringent control over dimensional tolerances. In addition, internal and surface microstructures can greatly influence thermal, mechanical, optical, electronic, and many other material properties. Thus it is important to understand and control the fundamental processes that govern thin film deposition at the nano- and micro-scale.