Ultra-thin deep ultraviolet perfect absorber using an Al/TiO 2 /AlN system

  • Takashima Y
  • Nagamatsu K
  • Haraguchi M
  • et al.
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Abstract

An ultra-thin perfect absorber for deep ultraviolet light was realized using an Al/TiO 2 /AlN system. The TiO 2 thickness was optimized using the Fresnel phasor diagram in complex space to achieve perfect light absorption. As a result of the calculation almost perfect absorption into the TiO 2 film was found, despite the film being much thinner than the wavelength. An optimized Al/TiO 2 /AlN system was fabricated, and an average absorption greater than 97% was experimentally demonstrated at wavelengths of approximately 255–280 nm at normal light incidence. Our structure does not require nanopatterning processes, and this is advantageous for low-cost and large-area manufacturing.

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APA

Takashima, Y., Nagamatsu, K., Haraguchi, M., & Naoi, Y. (2022). Ultra-thin deep ultraviolet perfect absorber using an Al/TiO 2 /AlN system. Optics Express, 30(24), 44229. https://doi.org/10.1364/oe.474847

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