Techniques of surface optical breakdown prevention for low-depths femtosecond waveguides writing

Abstract

We demonstrated technique of direct femtosecond waveguide writing at record low depth (2-15 μm) under surface of lithium niobate, that play a key role in design of electrooptical modulators with low operating voltage. To prevent optical breakdown of crystal surface we used high numerical aperture objectives for focusing of light and non-thermal regime of inscription in contrast to widespread femtosecond writing technique at depths of tens micrometers or higher. Surface optical breakdown threshold was measured for both x- and z- cut crystals. Inscribed waveguides were examined for intrinsic microstructure. It also reported sharp narrowing of operating pulses energy range with writing depth under the surface of crystal, that should be taken in account when near-surface waveguides design. Novelty of the results consists in reduction of inscription depth under the surface of crystals that broadens applications of direct femtosecond writing technique to full formation of near-surface waveguides and postproduction precise geometry correction of near-surfaces optical integrated circuits produced with proton-exchanged technique.