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Relating Friction and Processes Development during Chemical — Mechanical Polishing (CMP)

  • Ilie F
  • Laurian T
  • Tita C
Springer Berlin Heidelberg, (2009), 571-575
DOI: 10.1007/978-3-642-03653-8_184
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Ilie, F., Laurian, T., & Tita, C. (2009). Relating Friction and Processes Development during Chemical — Mechanical Polishing (CMP). In Advanced Tribology (pp. 571–575). Springer Berlin Heidelberg. https://doi.org/10.1007/978-3-642-03653-8_184

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