Density of defect states retrieved from the hysteretic gate transfer characteristics of monolayer MoS 2 field effect transistors

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Abstract

Defect states play an important role in low-dimensional semiconductor devices. However, it becomes increasingly challenging to find the density of defect states for ultra-scaled devices using traditional capacitive techniques such as capacitance-voltage (CV) method and deep level transient spectroscopy (DLTS). Here, we proposed a model to quantitatively retrieve the density of defect states from the hysteretic gate transfer characteristics of field effect transistors (FETs), and applied it to monolayer MoS 2 FETs before and after superacid treatment. We found that the superacid treatment significantly reduced the density of deep level defects. As a result, the photoluminescence was enhanced 19 folds due to the suppression of non-radiative recombination via deep level defects.

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Xu, Q., Sun, Y., Yang, P., & Dan, Y. (2019). Density of defect states retrieved from the hysteretic gate transfer characteristics of monolayer MoS 2 field effect transistors. AIP Advances, 9(1). https://doi.org/10.1063/1.5082829

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