All-optical modulation in a CMOS-compatible amorphous silicon-based device

Abstract

Active silicon photonic devices, which dynamically control the flow of light, have received significant attention for their use in on-chip optical networks. High-speed active silicon photonic modulators and switches rely on the plasma dispersion effect, where a change in carrier concentration causes a variation in the refractive index. The necessary electron and hole concentration change can be introduced either by optical pumping, or by direct electrical injection and depletion. We demonstrate a fast photoinduced absorption effect in low loss hydrogenated amorphous silicon (a-Si:H) waveguides deposited at a temperature as low as 190 °C. Significant modulation (M% ~90%) occurs with a 1 mm-long device. We attribute the enhanced modulation to the significantly larger free-carrier absorption effect of a-Si:H. The complementary metal-oxide semiconductor (CMOS) compatible technology of a-Si:H could be considered as a promising candidate to enable an easy back-end integration with standard microelectronics processes.