This paper reports low temperature solution processed ZnO thin film transistors (TFTs), and the effects of interfacial passivation of a 4-chlorobenzoic acid (PCBA) layer on device performance. It was found that the ZnO TFTs with PCBA interfacial modification layers exhibited a higher electron mobility of 4.50 cm2 V-1 s-1 compared to the pristine ZnO TFTs with a charge carrier mobility of 2.70 cm2 V-1 s-1. Moreover, the ZnO TFTs with interfacial modification layers could significantly improve device shelf-life stability and bias stress stability compared to the pristine ZnO TFTs. Most importantly, interfacial modification layers could also decrease the contact potential barrier between the source/drain electrodes and the ZnO films when using high work-function metals such as Ag and Au. These results indicate that high performance TFTs can be obtained with a low temperature solution process with interfacial modification layers, which strongly implies further potential for their applications.
CITATION STYLE
Wan, L., He, F., Qin, Y., Lin, Z., Su, J., Chang, J., & Hao, Y. (2018). Effects of interfacial passivation on the electrical performance, stability, and contact properties of solution process based ZnO thin film transistors. Materials, 11(9). https://doi.org/10.3390/ma11091761
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