Fullerene grafted photoacid generator(PAG) bound polymer resists

Abstract

Two polymeric fullerene derivatives and corresponding fullerene grafted, PAG bound polymer resists (HS-EM-HM/Fulle-PAG) based on hydroxystyrene (HS), 2-ethyl-2-adamantyl methacrylate (EM), 3-hydroxy-l-admantyl methacrylate (HM) were prepared and characterized. The preliminary lithographic performance of these polymers were conducted with a contact printer, e-beam, and structure-function relationships were also studied. The results demonstrated that the thermostability and glass transition temperatures increased, but sensitivity and resolution decreased. Further investigations about microstructure modification, composition effect, exposure conditions on the lithographic properties will be carried out. © 2008 CPST.