Co-deposition characteristics of nanodiamond particles in electrolessly plated nickel films

Abstract

Co-deposition characteristics of refined nanodiamond particles (5 nmφ) into electrolessly plated nickel films were studied. Effects of concentration, temperature and pH of the baths were investigated. It is suggested that nanodiamond particles are co-deposited into the film after adsorption on a surface of the plated film. The authors found that the content of diamond particles in the film increased with decreasing deposition rate and decreasing hydrogen evolution rate accompanied by plating reaction. The content did not exceed 2% when we use an ordinary plating solution; ammoniacal-citrate nickel plating bath.