Catalyst-free growth of high-optical quality GaN nanowires by metal-organic vapor phase epitaxy

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Abstract

Catalyst-free GaN wires with 100-200 nm diameters are grown on bare c-sapphire substrates by a metal-organic vapor phase epitaxy approach using both low V/III ratio and V-III precursor flows that favor a reaction-limited growth regime. The polarity control of the initial seeds allows obtaining pencil-shape wires with very sharp pyramids at their top (∼5 nm diameter). These defect-free nanowires evidence excellent structural and optical properties as shown by a sharp photoluminescence linewidth (1-3 meV at 5 K). © 2011 American Institute of Physics.

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Chen, X. J., Gayral, B., Sam-Giao, D., Bougerol, C., Durand, C., & Eymery, J. (2011). Catalyst-free growth of high-optical quality GaN nanowires by metal-organic vapor phase epitaxy. Applied Physics Letters, 99(25). https://doi.org/10.1063/1.3671365

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