Abstract
A capacitively coupled plasma reactor was used for PECVD technology, where methane was introduced into the plasma reactor through the shower head. The concentration of species in the carbon films were determined by RBS and ERD method. The RBS results showed the main concentrations of C in the films. The concentration of hydrogen was approximately 20 at.%. The films contain a small amount of oxygen and nitrogen. Chemical compositions were analyzed by FTIR spectroscopy. IR results showed the presence of C-H specific bonds.
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CITATION STYLE
Huran, J., Zat’ko, B., Boháček, P., Kobzev, A. P., Vincze, A., L’Malinovský, & Valovič, A. (2010). Properties of hydrogenated amorphous/nanocrystalline carbon films prepared by plasma enhanced chemical vapour deposition. In IOP Conference Series: Materials Science and Engineering (Vol. 12). Institute of Physics Publishing. https://doi.org/10.1088/1757-899X/12/1/012005
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