Reactive Sputter Deposition, Springer Series in Materials Science, vol. 109

  • Depla D
  • Mahieu S
ISSN: 03603164
N/ACitations
Citations of this article
13Readers
Mendeley users who have this article in their library.

Abstract

The use of thin films is continuously expanding. In the family of Physical Vapour Deposition techniques, sputtering is one of the most important over the past 40 years. In this book, all aspects of the reactive magnetron sputtering process, from the discharge up to the resulting thin film growth, are described in detail, allowing the reader to understand the complete process. Hence, this book gives necessary information for those who want to start with reactive magnetron sputtering, understand and investigate the technique, control their sputtering process and tune their existing process, obtaining the desired thin films.

Cite

CITATION STYLE

APA

Depla, D. (Diederik), & Mahieu, S. (Stijn). (2008). Reactive Sputter Deposition, Springer Series in Materials Science, vol. 109 (p. 570). Springer.

Register to see more suggestions

Mendeley helps you to discover research relevant for your work.

Already have an account?

Save time finding and organizing research with Mendeley

Sign up for free