Development of the α-igzo/ag/α-igzo triple-layer structure films for the application of transparent electrode

13Citations
Citations of this article
6Readers
Mendeley users who have this article in their library.

Abstract

We investigated the structural optical and electrical properties of amorphous IGZO/silver/amorphous IGZO (α-IGZO/Ag/α-IGZO) triple-layer structures that were deposited at room temperature on Eagle XG glass and flexible polyethylene terephthalate substrates through the sputtering method. Thin Ag layers with different thicknesses were inserted between two IGZO layers to form a triple-layer structure. Ag was used because of its lower absorption and resistivity. Field emission scanning electron microscopy measurements of the triple-layer structures revealed that the thicknesses of the Ag layers ranged from 13 to 41 nm. The thickness of the Ag layer had a large effect on the electrical and optical properties of the electrodes. The optimum thickness of the Ag metal thin film could be evaluated according to the optical transmittance electrical conductivity and figure of merit of the electrode. This study demonstrates that the α-IGZO/Ag/α-IGZO triple-layer transparent electrode can be fabricated with low sheet resistance (4.2 ω/) and high optical transmittance (88.1%) at room temperature without postannealing processing on the deposited thin films.

Cite

CITATION STYLE

APA

Chen, K. N., Yang, C. F., Wu, C. C., & Chen, Y. H. (2017). Development of the α-igzo/ag/α-igzo triple-layer structure films for the application of transparent electrode. Materials, 10(3). https://doi.org/10.3390/ma10030226

Register to see more suggestions

Mendeley helps you to discover research relevant for your work.

Already have an account?

Save time finding and organizing research with Mendeley

Sign up for free