Annealing Effect on the Growth of Nanostructured TiO2 Thin Films by Pulsed Laser Deposition (PLD)

Abstract

In this work, Nanostructured TiO 2 thin films were grown by pulsed laser deposition (PLD) technique on glass substrates at 300 °C. TiO 2 thin films were then annealed at 400-600 °C in air for a period of 2 hours. Effect of annealing on the structure, morphology and optical properties were studied. The X-ray diffraction (XRD) and Atomic Force Microscopy (AFM) measurements confirmed that the films grown by this technique have good crystalline tetragonal mixed anatase and rutile phase structure and homogeneous surface. The study also reveals that the RMS value of thin films roughness increased with increasing annealing temperature .The optical properties of the films were studied by UV-VIS spectrophotometer. The optical transmission results shows that the transmission over than ~65% which decrease with the increasing of annealing temperatures. The allowed indirect optical band gap of the films was estimated to be in the range from 3.49 to 3.1 eV. The allowed direct band gap was found to decrease from 3.74 to 3.55 eV with the increase of annealing temperature. The refractive index of the films was found from 2.27-2.98 at 550nm. The extinction coefficient increase with annealing temperature. ‫ل‬ ‫اﻟدﻗﯾﻘﺔ‬ ‫اﻻﻏﺷﯾﺔ‬ ‫اﻧﻣﺎء‬ ‫ﻋﻠﻰ‬ ‫اﻟﺗﻠوﯾن‬ ‫ﺗﺄﺛﯾر‬) (TiO 2 ‫اﻟﺗرﻛﯾب‬ ‫ذات‬ ‫ﺑواﺳطﺔ‬ ‫اﻟﺛﺎﻧوي‬ ‫اﻟﻧﺑﺿﻲ‬ ‫اﻟﻠﯾزر‬ ‫ﺗرﻛﯾب‬ ‫اﻟﺧﻼﺻﺔ‬ ‫اﻟ‬ ‫ھذه‬ ‫ﻓﻲ‬ ‫ﺑﺣث‬ ، ‫ﺎﻧﯾوم‬ ‫اﻟﺗﯾﺗ‬ ‫ﯾد‬ ‫اوﻛﺳ‬ ‫ﯾﺔ‬ ‫أﻏﺷ‬ ‫اﻧﻣﺎء‬ ‫ﺗم‬) (TiO 2 ‫ﺔ‬ ‫اﻟﻧﺎﻧوﯾ‬ ‫طﺔ‬ ‫ﺑواﺳ‬ ‫ﺔ‬ ‫ﺗﻘﻧﯾ‬ ‫زر‬ ‫اﻟﻠﯾ‬ ‫ﯾب‬ ‫ﺗرﺳ‬ ‫اﻟﻧﺑﺿﻲ‬ (PLD) ‫ﺔ‬ ‫زﺟﺎﺟﯾ‬ ‫د‬ ‫ﻗواﻋ‬ ‫ﻋﻠﻰ‬ ‫ﻲ‬ ‫ﻓ‬ ‫رارة‬ ‫ﺣ‬ ‫ﺔ‬ ‫درﺟ‬ 300 ‫ﺔ‬ ‫ﻣﺋوﯾ‬. ‫ن‬ ‫وﻣ‬ ‫م‬ ‫ﺛ‬ ‫دﻧت‬ ‫ﻟ‬ ‫ﯾﺔ‬ ‫أﻏﺷ‬ TiO 2 ‫اﻟرﻗﯾﻘﺔ‬ ‫ﻣن‬ 400 ‫اﻟﻰ‬ 600 ‫ﻓﻲ‬ ‫ﻣﺋوﯾﺔ‬ ‫درﺟﺔ‬ ‫اﻟﮭواء‬ ‫ﺳﺎﻋﺗﯾن‬ ‫ﻟﻣدة‬. ‫ب‬ ‫ﺗرﻛﯾ‬ ‫ﻋﻠﻰ‬ ‫اﻟﺗﻠدﯾن‬ ‫ﺗﺄﺛﯾر‬ ‫دراﺳﺔ‬ ‫وﺗم‬ ‫اﻟﺳطﺢ‬ ‫وطﺑوﻏراﻓﯾﺔ‬ ‫رﯾﺔ‬ ‫اﻟﺑﺻ‬ ‫واﻟﺧﺻﺎﺋص‬. ‫ﺎت‬ ‫ﻗﯾﺎﺳ‬ ‫ن‬ ‫ﻣ‬ ‫ﯾﻧﯾﺔ‬ ‫اﻟﺳ‬ ‫ﻌﺔ‬ ‫اﻷﺷ‬ ‫ود‬ ‫ﺣﯾ‬ (XRD) ‫وة‬ ‫اﻟﻘ‬ ‫ر‬ ‫وﻣﺟﮭ‬ ‫اﻟذرﯾﺔ‬) (AFM ‫ﺔ‬ ‫اﻟطرﯾﻘ‬ ‫ذه‬ ‫ﺑﮭ‬ ‫اﻟﻣﻧﻣﺎت‬ ‫اﻻﻏﺷﯾﺔ‬ ‫ﺑﺄن‬ ‫اﺛﺑت‬ ‫ﻟﮭ‬ ‫ﯾط‬ ‫وﺧﻠ‬ ‫ﺎﻋﻲ‬ ‫رﺑ‬ ‫ب‬ ‫ﺗرﻛﯾ‬ ‫وذات‬ ‫د‬ ‫ﺟﯾ‬ ‫ور‬ ‫ﺗﺑﻠ‬ ‫ﺎ‬ PDF created with pdfFactory Pro trial version www.pdffactory.com Annealing Effect on the Growthof Nanostructured TiO 2 Thin Films by Pulsed Laser Deposition (PLD) 461 ‫طورﯾن‬ ‫ﻣن‬ ‫واﻟروﺗﯾل‬ ‫اﻷﻧﺎﺗﺎس‬ ‫ﻣﺗﺟﺎﻧس‬ ‫ﺳطﺢ‬ ‫وذات‬. ‫ﺔ‬ ‫اﻟدراﺳ‬ ‫وﺗظﮭر‬ ‫ﯾم‬ ‫ﻗ‬ ‫ﺄن‬ ‫ﺑ‬ RMS ‫ﺔ‬ ‫اﻟرﻗﯾﻘ‬ ‫ﯾﺔ‬ ‫ﻟﻸﻏﺷ‬ ‫ﺗزداد‬ ‫واﻟﺧﺷوﻧﺔ‬ ‫ﻊ‬ ‫ﻣ‬ ‫زﯾﺎدة‬ ‫درﺟﺔ‬ ‫اﻟﺣرارة‬ ‫اﻟﺗﻠدﯾن‬. ‫وﺗم‬ ‫دراﺳﺔ‬ ‫ﺎف‬ ‫ﻣطﯾ‬ ‫ﻲ‬ ‫ﻓ‬ ‫ﯾﺔ‬ ‫ﻟﻸﻏﺷ‬ ‫اﻟﺑﺻرﯾﺔ‬ ‫اﻟﺧﺻﺎﺋص‬ ‫ﺟﯾﺔ‬ ‫اﻟﺑﻧﻔﺳ‬ ‫وق‬ ‫وﻓ‬ ‫ﺔ‬ ‫اﻟﻣرﺋﯾ‬ ‫ﻌﺔ‬ ‫ﻟﻸﺷ‬ ‫ﺔ‬ ‫اﻟﻧﻔﺎذﯾ‬) ‫ﺑ‬ ‫ت‬ ‫ﻗﯾﺳ‬ ‫ﺎف‬ ‫ﻣطﯾ‬ ‫طﺔ‬ ‫واﺳ‬ (UV-VIS. ‫ﺎﺋﺞ‬ ‫ﻧﺗ‬ ‫ﺔ‬ ‫اﻟﻧﻔﺎذﯾ‬ ‫اﻟﺿوﺋﯾﺔ‬ ‫ﻣن‬ ‫أﻛﺛر‬ ‫ﻧﻔﺎذﯾﺔ‬ ‫ھﻧﺎﻟك‬ ‫ﺑﺄن‬ ‫ﺗظﮭر‬ ~ 65٪ ‫واﻟﺗﻲ‬ ‫ﺗﻘل‬ ‫ﻊ‬ ‫ﻣ‬ ‫ﺎدة‬ ‫زﯾ‬ ‫رارة‬ ‫اﻟﺣ‬ ‫ﺎت‬ ‫درﺟ‬ ‫دﯾن‬ ‫اﻟﺗﻠ‬. ‫وة‬ ‫ﻓﺟ‬ ‫ن‬ ‫ﻣ‬ ‫دود‬ ‫ﺑﺣ‬ ‫درة‬ ‫ﻗ‬ ‫ﯾﺔ‬ ‫اﻷﻏﺷ‬ ‫رة‬ ‫ﻣﺑﺎﺷ‬ ‫ر‬ ‫ﯾ‬ ‫ﻐ‬ ‫اﻟ‬ ‫ﻣوﺣﺔ‬ ‫اﻟﻣﺳ‬ ‫رﯾﺔ‬ ‫اﻟﺑﺻ‬ ‫ﺔ‬ ‫اﻟطﺎﻗ‬ 3.49 ‫ﻰ‬ ‫اﻟ‬ 3.1 ‫رون‬ ‫اﻟﻛﺗ‬ ‫ﻓوﻟت‬. ‫اﻟ‬ ‫ﻣوﺣﺔ‬ ‫اﻟﻣﺳ‬ ‫رﯾﺔ‬ ‫اﻟﺑﺻ‬ ‫اﻟطﺎﻗﺔ‬ ‫ﻓﺟوة‬ ‫ان‬ ‫ووﺟد‬ ‫ن‬ ‫ﻣ‬ ‫ل‬ ‫ﺗﻘ‬ ‫رة‬ ‫ﻣﺑﺎﺷ‬ 3.74 ‫ﻰ‬ ‫اﻟ‬ 3.55 ‫ت‬ ‫ﻓوﻟ‬ ‫رون‬ ‫إﻟﻛﺗ‬ ‫دﯾن‬ ‫اﻟﺗﻠ‬ ‫رارة‬ ‫ﺣ‬ ‫درﺟﺔ‬ ‫ﺑزﯾﺎدة‬. ‫ﯾﺔ‬ ‫ﻟﻸﻏﺷ‬ ‫ﺎر‬ ‫اﻻﻧﻛﺳ‬ ‫ل‬ ‫ﻣﻌﺎﻣ‬ ‫ان‬ ‫د‬ ‫ووﺟ‬ ‫ن‬ ‫ﻣ‬ ‫راوح‬ ‫ﺗﺗ‬ 2.27 ‫ﻰ‬ ‫اﻟ‬ 2.98 ‫د‬ ‫ﻋﻧ‬ ‫اﻟﻣوﺟﻲ‬ ‫اﻟطول‬ 550 ‫ﻧﺎﻧوﻣﺗر‬. ‫اﻟﺗﻠدﯾن‬ ‫ﺣرارة‬ ‫درﺟﺔ‬ ‫ﺑزﯾﺎدة‬ ‫ﯾزداد‬ ‫اﻟﺧﻣود‬ ‫ﻣﻌﺎﻣل‬ ‫وان‬ .