Improved Performance of Junctionless Tunnel FETs with Source/Channel Heterostructure

Abstract

We propose a junctionless tunnel FET architecture with a heterostructure at the source/channel interface. We show that the use of a low bandgap material in the source of this device results in significant ON current improvement. We further show that ON current improvement can also be achieved by using a low-k isolation dielectric. The proposed device architecture which combines the merits of both junctionless FETs and Tunnel FETs can be a potential candidate for sub-20nm technology node.