An ion implanter (see Fig. 2.1) consists of the following major components: an ion source, an extracting and ion analyzing mechanism, an accelerating column, a scanning system and an end station [2.1]. The ion source contains the species to be implanted either as solids, or as liquids or as gases and an ionizing system to ionize the species. The source produces an ion beam with very small energy spread enabling high mass resolution. Ions are extracted from the source by a small accelerating voltage and then injected into the analyzer magnet.
CITATION STYLE
Rimini, E. (1995). Ion Implanters. In Ion Implantation: Basics to Device Fabrication (pp. 33–77). Springer US. https://doi.org/10.1007/978-1-4615-2259-1_2
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