A novel and simple fabrication method of embedded SU-8 micro channels by direct UV lithography

Abstract

In this paper, we presents a novel and simple method to fabricate embedded micro channels. The method based on different light absorption properties of the SU-8 thick photoresist under different incident UV wavelengths. The channel structures are defined by the ordinary I-line, while the cover layer is patterned by the deep UV. Because the deep UV is obtained directly on the same aligner with a set of filter mirrors, the embedded channel can be easily produced without other rare facilities. Besides, the relationship between the thickness of the top layer and the exposure dose of the deep UV has been measured by an ingeniously designed experiment. The specific thickness of the top layer of the embedded micro channel can then be secured by the specific deep-UV exposure dose. Further more, many meaningful mechanical structures have been realized by this method, the material property of the top layer are also measured. © 2006 IOP Publishing Ltd.